Veeco Introduces MaxBright MOCVD Multi-Reactor System
Feb 10, 2011 Veeco Instruments Inc.has announced the introduction of the TurboDisc(R) MaxBright(TM) Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) Multi-Reactor System for production of high-brightness light-emitting diodes (HB LEDs).
MaxBright leverages Veeco's market-leading Uniform FlowFlange(R) technology and automation expertise by combining multiple, new, high-throughput MOCVD reactors in a modular two- or four-reactor cluster architecture. The MaxBright reactors, based on the production-proven K465i, feature both expanded wafer capacity and advanced, proprietary, closed-loop, thermal control technology. These reactors achieve 25% higher throughput than the standard K465i, while extending proven performance advantages - uniformity, repeatability and material quality. The MaxBright MOCVD system offers industry-leading wafer capacity of up to 216 x 2", 56 x 4", 24 x 6" or 12 x 8" wafers. In addition, seamless recipe transfer from K465i to MaxBright enables customers to achieve rapid production start.
Author: BIO T&T
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